IEEJ Transactions on Sensors and Micromachines
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
Paper
Stiction Recovery of Silicon Oxide Cantilevers with Pulse Laser Irradiation for MEMS
Masashi NakataKazuyoshi FushinobuKen Okazaki
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2002 Volume 122 Issue 3 Pages 144-149

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Abstract

Recovery of stiction-failed micro-cantilevers with excimer laser irradiation has been attempted on silicon oxide cantilevers. Micro-cantilevers with various lengths and widths have been fabricated from thermo-oxidized silicon with micromachining process. ArF laser (λ=193nm) and KrF laser (λ=248nm) were used for experiments. Laser stiction recovery is possible on micro-cantilevers made of silicon oxide. Recovery yield is dependent on laser fluence and wavelength. ArF laser light, which is well absorbed by silicon oxide, can recover stiction-failed cantilevers more effectively. Adhesion and stiction-recovery do not depend on the width of cantilever. The results are compared with previous data of silicon cantilevers. Using the model that considers the sum of elastic force and thermoelastic force as restoring force, the free standing yield after laser irradiation is calculated. The theoretical results exhibit qualitative agreement with the experimental data of both silicon oxide and silicon cantilevers. This indicates that the thermoelastic force plays an important role in stiction recovery, and its temporal profile may have an influence on the recovery yield.

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© 2002 by the Institute of Electrical Engineers of Japan
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