IEEJ Transactions on Sensors and Micromachines
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
Paper
Development of Pressure Sensors for High Temperature Operation
Masaaki YoshitakeToshikazu NosakaTadaoki KusakaYoshihiko SuzukiHiroshi TakenakaMikio Sawamura
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2004 Volume 124 Issue 5 Pages 183-189

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Abstract
A pressure sensor for use in a high temperature atmosphere (150˜250°C) has been developed. The pressure sensor consists of Cr-O thin film strain gauges, electrode films and an oxidation resistance film, which are all sputter deposited on a metal diaphragm covered with an SiO2 insulator. For the pressure measurement, a photolithographically patterned Wheatstone bridge circuit of the Cr-O thin film strain gauges was used. The output voltages showed good linearity with pressure and little hysteresis even at a temperature of 250°C. In order to prevent oxidation of the strain gauges at high temperatures, some sputtered oxidation resistance films were examined. It was shown that non-oxide films such as AlN and Si3N4 films have good characteristics to prevent oxidation of the strain gauges.
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© 2004 by the Institute of Electrical Engineers of Japan
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