High Sensitive Formaldehyde Gas Sensor Prepared by R.F. Induction Plasma Deposition Method

Abstract

The present work is concerned on developing high sensitive and high performance SnO₂-based gas sensors for detecting indoor air pollutant formaldehyde gas. The film was deposited on an alumina substrate using R.F. Induction Plasma Deposition technique. Physical properties of sensing films were examined by SEM, XRD method. The sensors showed high sensitivity to typical HCHO gas at an extremely low gas concentration of 20 parts-per-billion (ppb) with quick response and recovery time at several minutes. The effect of the doping of various metallic additives on the gas-sensing properties and operating temperature dependency were also investigated in the work.