IEEJ Transactions on Sensors and Micromachines
Online ISSN : 1347-5525
Print ISSN : 1341-8939
ISSN-L : 1341-8939
Review
Anisotropic Wet Etching for Micro-Fabrication
Mitsuhiro Shikida
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2008 Volume 128 Issue 9 Pages 341-346

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Abstract
Anisotropic wet etching process is now widely used in MEMS fabrication. The etching characteristics, mechanism of etch-pit formations on both of {100} and {111} Si surfaces, and micro pyramid formation on the etched {100} surface is described in this review paper. Advanced processes for fabricating complicated 3-D structures by wet etching are also explained.
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© 2008 by the Institute of Electrical Engineers of Japan
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