レジストプロセスの基本

佐々木 実

doi:10.1541/ieejsmas.131.2

Abstract

Basics of resist process are described including the practical techniques. The proximity patterning is cost-effective process having the potential realizing arbitrary 2-3μm width pattern. After explaining the standard processes and mechanisms, some issues in MEMS region is described.

Content from these authors

Favorites & Alerts

Recently viewed articles

時間分解静電気力顕微鏡による有機薄膜トランジスタのキャリアダイナミクスの可視化
The process of decrease and vegetation change after 1940's in the green spaces in the western part of Kamakura city, Kanagawa Prefecture
Genetic modifiers of rodent animal models: the role in cataractogenesis
Investigation of Risk Factors for Pedestrian Recognition Error using Active Safety Driving Recorder -Vehicle
3A1-G07 障害物の属性を考慮した自律移動ロボットの安全制御システムの開発(安全・安心なRT構築を目指して)

Announcements from publisher

A member of IEEJ can access the transactions of the Technical Society to which the member belongs. Please enter the My Page login ID in the subscriber number column and the birth date (year/month/date with one-byte characters: for example, 19800303) in the password column.

Predecessor

IEEJ Transactions on Industry Applications

IEEJ Transactions on Electronics, Information and Systems

IEEJ Transactions on Power and Energy

IEEJ Transactions on Fundamentals and Materials

The Journal of The Institute of Electrical Engineers of Japan

The transactions of the Institute of Electrical Engineers of Japan.C

The transactions of the Institute of Electrical Engineers of Japan.B

The transactions of the Institute of Electrical Engineers of Japan.A

The Journal of the Institute of Electrical Engineers of Japan

Related information

https://www.jstage.jst.go.jp/browse