Fabrication Electron Beam Lithography Pattern-based Plasmonic Crystal for Sensing Application

Abstract

The electron beam lithography (EBL) pattern-based plasmonic crystal for excitation of localized surface plasmon resonance (LSPR) was fabricated. For evaluation of sensing characteristics, lattice-shaped plasmonic crystal with different pitch was fabricated using EBL. These plasmonic crystals shows the different LSPR optical characteristics (peak shift and absorbance strength change), and the high sensitivity (up to 564.1 nm/refractive index unit (RIU)) could be observed. Based on these characteristics, plasmonic crystal is applicable to high sensitive label-free chemical or bio sensors.