Development of the Local Ambient Gas Control Technology and its Application to Atmospheric Pressure Plasma Processes

Abstract

Local ambient gas control technologies for atmospheric pressure plasma processes using a new curtain gas structure have been developed. The local ambient gas control was studied theoretically and experimentally. Safe and clean process conditions (reactive gas leakage below 0.1 vol.% and air contamination below 10ppm) were achieved in open air. H₂ plasma was generated with H₂ concentrations above the explosive limit (4.1% in air) successfully. As an application, Cu reduction and SiO₂ etching were demonstrated. These results indicate that our local ambient gas control technologies have adequate potential for atmospheric pressure plasma processes.