Abstract
This paper reports on a novel self-align fabrication process of narrow-gapped dual AFM (Atomic force microscopy) tip. The dual AFM tip was fabricated on (100) orientated Si substrate by using narrow trench etching, trench refilling with SOG (spin-on-glass), CMP (chemical-mechanical-polishing), and Si crystalline anisotropic etching. Through the process, a sharp dual AFM tip with a gap of 500 nm, which was defined by only the etched trench, width was successfully fabricated. Although other fabrication process using an acrylic-nitrile-styrene-epoxy resin refilling was also attempted, dual tip was not obtained due to the poor adhesion of the resin in silicon etching process. In addition, a dual AFM cantilever (Magneto-storictive film/Si 2.0 µm) was formed by MEMS fabrication process. The fabricated FePd 0.4 µm/Si 2.0 µm and Ni 1.3 µm/Si 2.0 µm cantilever were individually deflected to 1.4 µm at 300 Gauss and 0.4 µm at 240 Gauss due to effects of magnetic flux and negative-magneto-striction, respectively.
