Fabrication of Titanium Microstructures Using a Double-layer Mask Process

Abstract

To fabricate titanium microstructures for application in sensors and devices, the fabrication techniques for insulating film and three-dimensional microstructures are important. This study reports on the development of the techniques to fabricate alumina insulating films on titanium foil without warpage and microstructures such as cantilevers with different thicknesses by an electrolytic etching using a double-layer mask consisting of the alumina film and a photoresist film.