Deposition Thickness Sensor for Ion Sputtering Apparatus

Abstract

A quartz core microcantilever fabricated from an optical fiber tip can be utilized for monitoring of deposition thickness. Dynamic monitoring of deposition thickness was performed without influence of electrical noise in an ion sputtering apparatus. Resonance frequencies were measured as a function of deposition time of Au and Ag. Resonance frequency decreased from 11.52kHz to 10.89kHz during a deposition time of 60 minutes which corresponded to a thickness of 360nm in case of Au.