Electron Phase Microscopy for Superconductors

抄録

Phase distribution in an electron beam can now be precisely measured towithin 1/100th of the electron wavelength using both electron holography anda “coherent” field-emission electron beam. This technique allows for theultra-fine measurement of material structures and electromagnetic fild distributionson a microscopic scale. Flux lines in a superconducting thin film can beobserved quantitatively by electron-holographic interference microscopy anddynamically by Lorentz microscopy.