MODEL BASED REPETITIVE CONTROL FOR PEELING FRONT GEOMETRY CONTROL IN A ROLL-TO-ROLL PEELING PROCESS

抄録

Roll-to-roll(R2R) peeling is an innovative method that transfers flexible electronics and 2D materials from the flexible substrate where they are grown to the end-use substrate. This process enables the full potential of R2R 2D material fabrication methods in a continuous, high-throughput, and environment-friendly manner. During the R2R peeling process, the device patterning causes periodic changes in the adhesion energy between the device and substrate. This periodic disturbance can degrade the quality of the final product if not properly controlled. Current control methods used for the R2R peeling process do not explicitly reject the periodic disturbance. It is therefore desirable to develop a controller that is capable of performing periodic disturbance rejection. This paper presents a model-based repetitive controller that integrates a frequency estimation of the disturbance into the R2R peeling control to maintain the optimal peeling process performance. A linear estimator using system identification techniques is employed. The simulation results show that the developed controller achieves better R2R process performance when compared to a conventional model-based controller.