ISIJ International
Online ISSN : 1347-5460
Print ISSN : 0915-1559
ISSN-L : 0915-1559
Rupture Phenomena of Molten Na2O·2SiO2 Thin Films
Taichi KuranagaYasushi SasakiYoshiaki KashiwayaKuniyoshi Ishii
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ジャーナル オープンアクセス

1999 年 39 巻 6 号 p. 548-552

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抄録
A thin film drawn-out technique was developed to investigate the rupture mechanism of molten sodium silicate thin films. The rupture length of molten sodium silicate films was measured as a function of temperature and the drawn-out rate. It was found that the rupture thickness, T, was dependent on the drawn-out rate, v, at high drawn out rate, being proportional to the 2/3rd of v, i.e.,

T oc (v)2/3

At low drawn-out rate the rupture thickness was found to be independent from v below a critical value vc.
It was concluded that the rupture at high drawn-out rate was controlled by the external drawn-out rate of the molten slag and the constant rupture thickness at the low drawn-out rate might be determined by the Plateau border suction flow.
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© The Iron and Steel Institute of Japan

This is an open access article under the terms of the Creative Commons Attribution-NonCommercial-NoDerivs license.
https://creativecommons.org/licenses/by-nc-nd/4.0/
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