Development of a New a-Si Photoreceptor Drum by DC Plasma CVD

Abstract

We developed a new DC plasma CVD layer deposition process for a-Si photoreceptor drums instead of the ordinary high f-requency 13.56 MHz plasma process. This has made the layer deposition process speed 2 times faster, minimized by-produ-ct powder generation and improved the surface smoothness of the a-Si drum. Through these improvements, we realized pro-duction cost reduction. This makes it easier to offer smalldiameter a-Si drums for tandem color printers, where growth in demand is predicted.