Abstract
An ellipsometry is a metrology technique that measures a polarization state upon light reflection on a sample surface, and is able to determine a film thickness non-destructively with a high accuracy of nanometers. This technique is widely utilized for investigating the thickness and the optical properties of thin films in many industrial/scientific fields such as semiconductors, optics and electronics. Recent advances in computer and multichannel detector technologies opened a new era of the spectroscopic ellipsometry technique that has drastically expanded the application field for complex thin film samples. In this paper, the principle and the measurement/analysis methods of the spectroscopic ellipsometry are described and practical applications of the spectroscopic ellipsometny for thin film products are discussed.
