抄録
The effects of substrate temperature (Ts), oxygen partial pressure and target composition on structure and magnetic properties of the sputtered strontium ferrite films were investigated. It is found that when Ts>400℃ the films begin to crystallization and the increase of substrate temperature and oxygen partial pressure are beneficial to improve c-axis orientation normal to the film plane. The saturation magnetization Ms increases with the increase of substrate temperature Ts and decreases slightly with the increase of oxygen partial pressure. The film prepared by the target composition of SrO・4Fe_2O_3 in 600℃ has highest value of Ms and Hc in perpendicular direction, that is 321 emu/cm^3 and 3.4 kOe, respectively.
