Abstract
Low surface energy fluoropolymer films were prepared on silicon substrates by dip-coating process. The thickness of the films was measured by the spectroscopic phase modulated ellipsometer. It has the advantages that measurement can be accomplished faster compared with the conventional rotating analyser ellipsometer, as well as an improvement in precision of the measurement by model fitting the ellipsometer parameter spectrum. We have demonstrated that ultra-thin film of thickness close to monolayer can be formed on Si under controllable dip-coating condition. The surface free energy of the ultra-thin fluoropolymer film determined by contact angle method was found fairly close to documented value. Film properties obtained by using various solvents in the dip-coating process were studied. In addition, the effect of the duration for the film stayed in the vapor zone will also be presented.
