Abstract
The induced anisotropy field H_k in very thin permalloy films sandwiched by Ta or Cu layers was investigated. The value of the H_k of Ta/Cu/Ni_79Fe_21/Cu/Ta film was found to decrease as the film thickness decreases below 20 nm. This H_k reduction is similar to that of the Ta/Ni_79Fe_21/Ta films indicating that the H_k reduction is independent of the surface energy or crystal structure of the seed layers. Thickness dependence of the film magnetostriction λ_<p-p> of theses films did not shows any clear correlation with that of H_k. This result indicates that the H_k reduction in thin films is not caused by the magnetostriction.
