先端の半導体製造プロセスに用いられるエアロゾル洗浄技術

抄録

Cryogenic aerosol cleaning is a very unique technology that cleans without the use of chemicals and de-ionized water. With optimization of recipe parameters, this technology will provide solutions for the significant problems or difficulties in new materials, e.g., high-k or metal gate, fragile porous low-k, sensitive gate pattern for 65 nm node, in which the conventional wet cleaning may not meet the requirements. As the technology node goes on for 45 nm node beyond, cryogenic aerosol technology will be required to be implemented for advanced production line.