論文
自己組織化する SiO2/TiO2/PMMA ナノ傾斜薄膜の成膜とその低反射特性
2004 年 112 巻 1303 号 p. 138-142
詳細
2004 年 112 巻 1303 号 p. 138-142
Self-organized nanograded SiO2/TiO2/Polymethyl methacrylate (PMMA) thin film was successfully prepared by only one coating from the combination of Tetraethyl orthosilicate (TEOS) and Titanium tetraisopropoxide (TTIP). Sufficient kinetics difference between two alkoxides was an important requirement for the processing of the graded thin film in this process. The film was colorless and transparent due to two gradual interfaces of three layers. The reflectance of the SiO2/TiO2/PMMA graded film was lower than 2% over a wide wavelength range, and this is attributed to the interference of lights reflected from both the SiO2 layer and TiO2 layer. Although further investigation and precise process control are required to further decrease reflectance, this film can be formed using only one coating process and has great potential as a new low reflective coating.
