ゾル・ゲル法によるNiO薄膜の作製
1993 年 101 巻 1170 号 p. 227-229
詳細
1993 年 101 巻 1170 号 p. 227-229
The films have been prepared by the dip-coating technique using nickel nitrate hexahydrate, Ni(NO3)2⋅6H2O, as starting material and ethylene glycol as solvent. In order to obtain uniform films the withdrawal speed should not exceed 12cm/min. The crystalline phase formed after firing at 500°C for 2h is nickel oxide, NiO, which belongs to the cubic system with lattice parameter a0=4.1769Å. The conductivities of NiO films are on the order of 10-6S⋅cm-1 in our measurements.
