シリカガラスの真空紫外光照射下における光透過率のその場測定

抄録

In-situ measurements of optical absorption in silica glass were carried out under irradiation of VUV light using undulator radiation. Optical loss at 6.7eV and 7.6eV increased with increasing of total dosage. It was also observed that the increase in the optical loss depends on the preparation method of silica glass. Optical loss caused by the VUV irradiation was restricted in silica glass having fluorine and OH groups.