抄録
An Au/Si3N4 interface was obtained by vapor deposition of Au on a Si3N4 substrate in vacuum, both at room temperature and 600°C. The interface structure and chemical composition were investigated by high resolution and analytical electron microscopy. A damaged phase was observed between Au and Si3N4 crystals. The thickness of this phase increased when the substrate surface was polished or the substrate was heated. This phase was found to be amorphous and merely composed of Si and N.
