Journal of the Ceramic Society of Japan (日本セラミックス協会学術論文誌)
Online ISSN : 1882-1022
Print ISSN : 0914-5400
ISSN-L : 0914-5400
シリコン半導体上におけるビスマス系層状構造強誘導体のリキツドソースを用いたケミカルアプローチ
加藤 一実鈴木 一行符 徳勝西澤 かおり三木 健
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2002 年 110 巻 1281 号 p. 403-407

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Ca2Bi4Ti5O18 (CBTi245) thin films were deposited by spin-coating a precursor solution of metal alkoxides on Pt-passivated Si substrates. Thickness of the as-deposited amorphous layer affected the nucleation site, microstructure and electrical properties. The onset of crystallization of thin films to a pyrochlore phase was below 550°C via rapid thermal annealing in oxygen. A perovskite phase developed by further annealing at temperatures of 650°C or higher. The CBTi245 thin films which were prepared by multi-coating and multicrystallizing of the 20 nm-thick amorphous layer showed random orientation, a columnar-like structure, and P-E hysteresis loops.

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