Papers
Equilibrium of dissolving species in aqueous H2SiF6 solution during the liquid phase deposition reaction
2009 年 117 巻 1363 号 p. 335-339
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2009 年 117 巻 1363 号 p. 335-339
The equilibrium reaction of H2SiF6 solution in the LPD method was investigated by the measurement of UV and IR spectroscopies, vapor pressure and electric conductivity. These measurements were carried out by adding the F- scavenger such as H3BO3 and Al metal which shifts the equilibrium reaction. The experimental results strongly suggested the presence of SiF4 and [SiF6·SiF4]2- in H2SiF6 solution. These species were estimated to be involved in the LPD process as intermediates and important for controlling the deposition process of metal oxide.
