Influences of underlayers on structure of TiO₂ thin films prepared by radio frequency magnetron sputtering

抄録

In this study, the effects of several underlayers (Cu, Co, Ag and Fe) on the thin structure of TiO₂ by RF magnetron sputtering were studied and compared. The results of X-ray diffraction (XRD) revealed that the Cu and Ag underlayer worsened the crystal quality of the TiO₂ films. When the Fe underlayer was used, fabricated TiO₂ film showed a mixture of rutile and anatase. The Co underlayer, on the other hand, induced TiO₂ anatase polycrystalline structure. This study also compared the surfactant effect of a Ag layer on the TiO₂ film structure. The results of XRD, X-ray photoelectron spectroscopy, and atomic force microscopy revealed that the Ag layer works as an effective surfactant for reducing the surface roughness and the rutile growth of TiO₂ film on the Fe underlayer.