A study of the incorporation of conducting materials into direct-patternable SnO₂ thin films formed by photochemical metal-organic deposition

抄録

Ag nanoparticles and multi-wall carbon nanotubes (MWNTs) were incorporated into a SnO₂ photosensitive precursor solution, and a direct-patternable film was prepared by photochemical metal-organic deposition. SnO₂ film transmittance and crystallinity were slightly reduced by light absorption of Ag nanoparticles and light scattering by MWNTs. In the case of mixed incorporation of Ag nanoparticles and MWNTs, the sheet resistance of SnO₂ hybrid films was decreased relative to incorporation of either single material. Direct-patterning of SnO₂ hybrid films was performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated at a low cost, and the electrical properties of SnO₂ films can be improved by incorporating Ag nanoparticles with MWNTs.