Journal of the Ceramic Society of Japan
Online ISSN : 1348-6535
Print ISSN : 1882-0743
ISSN-L : 1348-6535
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Laser chemical vapor deposition of TiN film on Ti(C,N)-based cermet substrate using Ti(OiPr)2(dpm)2–NH3 system
Yu YOUAkihiko ITORong TUTakashi GOTO
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2011 年 119 巻 1388 号 p. 310-313

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TiN films were prepared on Ti(C,N)-based cermet substrate by laser chemical vapor deposition using titanium isopropoxide dipivaloylmethane [Ti(OiPr)2(dpm)2] and ammonia (NH3) as precursors. The effects of deposition temperature (Tdep) and laser power (PL) on the crystal phase, microstructure and adhesion were investigated. TiN film was prepared at Tdep > 903 K (PL > 100 W). The microstructure of TiN film changed from rose-like grains to pyramid-like grains to aggregate grains with increasing PL and Tdep. Highly adhesive film was obtained at moderate Tdep = 1047 K (PL = 120 W).

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© 2011 The Ceramic Society of Japan
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