Influence of precursor concentration and growth time on the surface morphology and crystallinity of α-Ga₂O₃ thin films fabricated by mist chemical vapor deposition

抄録

Single-crystal thin films of gallium oxide (Ga₂O₃), an ultra-wide bandgap semiconductor, were fabricated on c-plane sapphire by mist chemical vapor deposition (mist CVD). The grown α-Ga₂O₃ thin films had low surface roughness, and we characterized their initial crystal growth phase by using atomic force microscopy and X-ray diffraction. By varying the precursor concentration, we changed the surface roughness and crystallinity of the thin films. The lattice constants of the α-Ga₂O₃ thin films almost matched those of the single crystal in the initial growth phase. We also found that these thin films grew hetero-epitaxially. Finally, mist CVD might have a very short incubation time in this system.