Journal of the Ceramic Society of Japan
Online ISSN : 1348-6535
Print ISSN : 1882-0743
ISSN-L : 1348-6535
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Relationship between the first sharp diffraction peak and physical properties of silicon dioxide (SiO2) glasses possessing different fictive temperatures
Hirokazu MASAIShinji KOHARAYohei ONODERAAkitoshi KOREEDAKazuya SAITOEdison Haruhico SEKIYANaoyuki KITAMURA
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ジャーナル オープンアクセス

2020 年 128 巻 12 号 p. 1038-1044

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Investigating the correlation between glass structure and physical properties is important for development of novel functional materials. It is well known that the physical and structural parameters of glass depend on the preparation condition. Fictive temperature, Tf, is one of the standards of glass obtained from the super-cooled liquid state. Since the Tf value is defined using structural relaxation of overtone mode of Si–O–Si vibration, correlation of the Tf with the structural ordering at longer range is worthy for exploring. Here, we examine structural change of SiO2 glass possessing different Tf values probed by the first sharp diffraction peak (FSDP) observed in X-ray diffraction data. By annealing of SiO2 glass, i.e. decreasing of Tf, a sharpening of the FSDP is observed. Both structural periodicity and the correlation length of the FSDP decrease with increasing the Tf. It is suggested that increase of smaller structural units contributing to the FSDP is the origin of the increase of elastic modulus of SiO2 glasses.

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© 2020 The Ceramic Society of Japan

この記事はクリエイティブ・コモンズ [表示 4.0 国際]ライセンスの下に提供されています。
https://creativecommons.org/licenses/by/4.0/deed.ja
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