Optimization of deposition conditions of yttrium doped-SrZrO₃ thin films fabricated by pulsed laser deposition

抄録

A SrZrO₃ thin film with yttrium (Y) concentration of 20 at % (SZYO) was successfully deposited by the pulsed laser deposition (PLD) technique. The laser power of PLD affected Y-concentration significantly even though it used the same PLD target. On contrary, the laser reputation frequency and the deposition temperature did not significantly affect the composition. The SZYO film deposited at the optimized conditions was well crystallized and showed no secondary phase and showed (111) and (110) orientations when they were deposited on (111)Pt/SiO_x/Si and on (111)Pd/(111)Pt/SiO_x/Si substrates, respectively. This SZYO film is expected to use as an electrode of our proposed novel solid oxide fuel cells.