Investigation of fluoride layer of yttria coatings prepared by aerosol deposition method

抄録

The fluorination of Yttria (Y₂O₃) coatings in the inner chamber wall of a plasma-etching equipment causes a process drift. In this paper, we investigate the relationship between the microstructure and fluoride layer of Y₂O₃ coatings prepared by aerosol deposition (AD) method compared with Y₂O₃ coatings prepared by atmospheric plasma spraying (APS) and ion plating (IP). The plasma corrosion of AD-coating, which has a highly dense microstructure without any pores, proceeded homogeneously and the specific surface area maintained its initial smooth surface. Moreover, F atoms slightly penetrated the AD-coating and formed a very thin, 45-nm fluoride layer after plasma exposure. The total area of the surface fluoride layer did not increase with plasma exposure time because the surface remained smooth. Therefore, Y₂O₃ coating prepared by AD can suppress surface fluorination and process drift compared with Y₂O₃ coatings prepared by APS and IP.