抄録
Anti-corrosion resistance of the coatings deposited by the Chemical Vapour Deposition (CVD) is considered to be influenced by the characteristics of the coatings, such as chemical composition, impurity, micro-pores, crystallographic orientation and so on. Study aims to examine the characteristics and corrosion resistance of titanium nitride coating deposited by Radio-Frequency (RF)-plasma CVD of TiCl4+N2+H2 reactants. The corrosion resistance of the coating is found to be influenced by the deposition conditions such as the substrate temperature and N2/TiCl4 mixing ratio to a great extent. A highly crystalline stoichiometric TiN coating with excellent anti-corrosion resistance in acidified solution could be synthesized at the substrate temperature higher than 923K and N2/TiCl4 mixing ration of 3. This coating contains very few chlorine in it and low prefered crystallographic orientation.
