表面分析へのアプローチ (IV)

イオン, 粒子の検出による表面分析

抄録

The aspects of surface analytical techniques by detecting outcoming ions and particles from samples concerned were summarized. Typical ion beam analyses by the use of high resolution mass spectrometric methods coupled to various ionization techniques such as spark source, glow discharge, ion bombardment, laser ionization. Elemental distribution in depth of surface layers by the ion scattering spectrometry using low, medium, high energy, elastic recoil detection analysis, and nuclear spectrometry were described. Several crystallographic defect analyses by the combination of channeling effect of incident ions and Rutherford back scattering spectrometry were introduced. The possibility of surface analysis using atomic, molecular and neutron beam was also mentioned.