抄録
Aluminum specimen covered with thin barrier type anodic oxide films was scratched with Si tip of AFM probe in a CuSO4 solution, and then cathodically polarized in the solution, using the Si tip as a counter electrode. During AFM probe scratching, oscillation of current was observed and decreased with scratching time. Analysis of the current oscillation enabled to examine the proceeding of the removal of anodic oxide films during AFM probe scratching. Silicon tip wore easily by scratching the oxide film-covered aluminum with a force. After AFM probe scratching, cathdic polarization of aluminum specimen caused the Cu deposition only at the film removed area, using a nitrocellulose film-coated Si tip as a counter electrode.
