低温工学
Online ISSN : 1880-0408
Print ISSN : 0389-2441
ISSN-L : 0389-2441
研究論文
電子ビーム蒸着法によるMgB2薄膜の作製とアニール効果
小林 裕希土井 俊哉北口 仁奥薗 雅也永友 康二朗濱田 秀造白樂 善則
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2005 年 40 巻 1 号 p. 7-12

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An electron-beam evaporation technique was used to prepare MgB2 thin films on polished sapphire C-plane single-crystal substrates with and without post-annealing. We maintained the background pressure to less than 1.3×10-7 Pa and the substrate temperature at 247-284°C. The Mg evaporation rate was 2 nm/s and B 0.5 nm/s. The best critical temperature (Tc) for the as-grown films was 34 K and the critical-current density (Jc) was 7.1×106 A/cm2 (4.2 K, self field.). In order to improve the crystallinity of the as-grown MgB2 thin films, we annealed them at 580-620°C for 1 hr under vacuum conditions. The Tc's of the post-annealed films increased about 4 K; however, Jc in the magnetic field decreased proportionate to the as-grown MgB2 thin film. From X-ray diffraction measurements, it was shown that the post-annealing process improved the crystallinity of the post-annealed film. The crystallinity of MgB2 grains may affect the Jc of MgB2 superconductors.

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© 2005 公益社団法人 低温工学・超電導学会 (旧 社団法人 低温工学協会)
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