可変面積型超LSI用電子ビーム露光装置について : 理化学研究所・情報科学研究室における研究開発の一例

抄録

This article outlines research and development using the electron beam lithography system conducted by Eiichi Goto and his colleagues at the Information Science Laboratory in the Institute of Physical and Chemical Research (RIKEN). Because the system can be used for production of very large-scale integrated circuits (VLSI), leading Japanese computer manufacturers organized the "VLSI Technology Research Association. " Supported by the government, the association worked diligently to develop the system. Meanwhile, the developments were also worked on by IBM, the Bell Telephone Laboratories and other companies. In this severe competition, Goto and his colleagues' contribution was notable. In particular, they were the first to invent the "variable shaped beam forming technique, " which was a very effective method for LSI pattern generation. Subsequently, they collaborated with the Japan Electron Optics Laboratory Co., and produced apparatuses with variable shaped beam lithography. They succeeded in this challenge, not because they were experts on semi-conductor devices, but because their approaches were original. As physicists, they researched electron optics, the basis of electron beam systems, and resolved difficulties concerning electron beam aberrations. Because they were familiar with computer systems which manipulated figures and algebraic formulas, they could program and use computer-aided design systems to design electrodes for the system. Their research did not just end up by the completion of the device. They also advanced improvements in the computer systems used as tools for development.