反応性スパッタ法によるSm-Fe超磁歪薄膜の作製

抄録

  Sm-Fe thin films as giant magnetostrictive materials were prepared by d.c. magnetron sputtering process with Ar or mixed N₂-Ar sputtering gas. In X-ray diffraction patterns of the film prepared by 2.3 vol% N₂-Ar as sputtering gas, diffraction peaks of SmN and Fe₂N where observed. With increasing N₂ gas amount, saturated magnetostriction of the Sm-Fe thin films decreased from 1400 ppm to 600 ppm. The maximum value of magnetostrictive susceptibility was showed at the film prepared by 1.0 vol% of N₂-Ar gas. The film prepared by pure Ar gas showed compressive stress with 0.5 GPa. Sm-Fe thin films prepared by mixed N₂-Ar gas showed about 0.7 GPa of compressive stress. Increasing of magnetostrictive susceptibility of films prepared by N₂-Ar gas due to reduce of perpendicular magnetic anisotropy energy.