Spectrochemical Determination of Trace amount of Vanadium and Silicon in Titanium Tetrachloride by the Addition Method. (Application of Quantitative Spectrochemical Analysis to Titanium Refining Industry (2nd Report))

Abstract

With the demand of high purity titanium sponge, the minut amounts of impurities in titanium tetrachloride have become of great significance to the titanium refining industry because small amounts of vanadium in titanium tetrachloride present as VOCl₃ are deleterious to Brinell hardness of titanium metal. A spectrochemical addition method for determining V and Si covering the concentration ranges of 0.008 to 0.0008% and 0.001 to 0.0002% in titanium tetrachloride respectively, is developed. Based on statistical consideration, the optimum intensity ratio, the selection of back-ground radiation and precision of this spectrochemical addition maked are discussed. Except the intensity ratio measurement and the preparation of analytical addition curve, the excitation condition and the photographic procedures are identical with those described in our previous report.