1960 年 24 巻 2 号 p. 85-88
Silver and arsenic in high-purity metallic silicon were determined by radioactivation method. The sample was irradiated in a pile by a neutron flux of 4×1011 n/cm2·sec intermittently for 3 days. Then silicon was expelled by treating with hydrofluoric acid. From the residue after the sublimation of silicon tetra fluoride, silver was separated as silver chloride and arsenic was collected on manganese dioxide. Carrying the analysis on two kinds of samples, 0.249 ppm silver and 0.0034 ppm arsenic, and 0.372 ppm silver and 0.0616 ppm arsenic were found.