管状反応器内に化学気相析出したTiN膜の微細組織

抄録

Reactant gas mixtures (TiCl₄, H₂, N₂) were introduced to the tublar reactor and TiN films were deposited on the inner wall of the reactor at different conditions (temperature, total gas flow rete, TiCl₄ concentration).
X-ray diffractometry and SEM observations were carried out to characterize the microstructures of the films. It was found that morphologies consisting of tiny needle-like and planar crystals appeared in the upstream regions, while the morphologies consisting of coarsened polyhedral grains with (110) orientation appeared in the downstream region.
The variation of the deposition temperature mainly influenced the grain size of the films. The total gas flow rate was responsible for the positions at which these morphologies appeared, and the higher TiCl₄ concentration gave rise to finner structures and less dominant (110) orientation.
The relationships between the film morphologies and their crystal orientation were studied by TEM observations.