日本金属学会誌
Online ISSN : 1880-6880
Print ISSN : 0021-4876
ISSN-L : 0021-4876
減圧熱プラズマ成膜法によるチタン酸鉛PbTiO3薄膜の合成に及ぼす成膜圧力の影響
永田 真吾脇谷 尚樹篠崎 和夫増田 善男水谷 惟恭
著者情報
ジャーナル フリー

1999 年 63 巻 1 号 p. 62-67

詳細
抄録

PbTiO3 thin films were prepared by low-pressure thermal plasma deposition method on (100)MgO substrates. The mists of the mixed solution of each metal alkoxides and 2-methoxyethanol were introduced into a plasma flame and deposited onto substrates. The constituent phases, the crystal texture and the surface morphology were drastically changed by the chamber pressure. Over 13332 Pa, single phase PbTiO3 films were obtained. They were grown epitaxially and their surface morphology was composed of rectangular shaped grains. The remnant polarization and coercive field of the film from the hysteresis loop were about 0.104 C·m−2 and 5.12 MV·m−1, respectively.

著者関連情報
© 社団法人 日本金属学会
前の記事 次の記事
feedback
Top