工業用純チタンの水素化物形成挙動に及ぼす窒素イオン注入の影響
1999 年 63 巻 8 号 p. 1015-1021
詳細
1999 年 63 巻 8 号 p. 1015-1021
A commercially supplied pure titanium was ion-implanted at 1.5 MeV with different doses of N2+ ranging from 5×1020 to 2×1021 ions per 1 m2, and the titanium hydride formation behavior was investigated in 10 mass% sulphuric acid aqueous solutions.
When the implantation dose is larger than 1×1021 ions per 1 m2, the titanium nitride is detected on the implanted surface by the atomic force microscope(AFM) and X-ray diffraction(XRD). According to the XRD analysis of the unimplanted specimen hydrogen-charged at a constant current density of 500 A/m2, the amount of hydride increases with increasing charging time and the whole surface is covered by hydride when the charging time is 12 ks. For all of the implanted specimens, on the other hand, the amount of hydride is less than that for the unimplanted specimens within the charging time of 12 ks. The amount of hydride on the specimen implanted with 1×1021 ions per 1 m2 is a little larger than those implanted with 5×1020 and 2×1021 ions per 1 m2. The observation by AFM supports the results of XRD analysis.
