Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
TiSi_2/Si Interface Instability in Plasma-assisted CVD of Ti
Y. Ohshita, K. Watanabe
Author information
JOURNAL FREE ACCESS

1998 Volume 25 Issue 3 Pages A20-

Details
Download PDF (150K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Article 1st page
Content from these authors
© 1998 The Japanese Association for Crystal Growth
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top