Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Oxygen concentration in Si crystals grown by using the electromagnetic CZ (EMCZ) method
Masahito WatanabeMinoru EguchiTaketoshi Hibiya
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1998 Volume 25 Issue 3 Pages A79-

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Abstract
We measured oxygen concentration and its distribution with radial direction in the Si crystals grown by using the electromagnetic CZ (EMCZ) method. Oxygen concentration changed from 1×10^<17> to 8×10^<17> cm^<-3> with changing the magnetic field strength and electrical current in the melt. The radial distribution was more homogeneous than that in crystals grown by the normal MCZ method. This results shows that EMCZ method has the advantage to control the oxygen concentration and its distribution in a large-diameter silicon crystal.
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© 1998 The Japanese Association for Crystal Growth
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