Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
23aB12 The two site competitive adsorption model for Silicon Carbide CVD Process
H SoneT KanekoN Miyakawa
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1999 Volume 26 Issue 2 Pages 97-

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Abstract
23aB12 The growth process of SiC-CVD was investigated by thermogravimeter, using MTS. The temperature dependence and MTS partial pressure dependence of SiC growth rate were examined. The partial pressure dependence was explained on the basis of the two sites competitive adsorption model.
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© 1999 The Japanese Association for Crystal Growth
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