Journal of the Japanese Association for Crystal Growth
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
Large lateral growth rate in GaN grown directly on sapphire substrate by two-flow metalorganic vapor phase epitaxy
K. MorimotoA. NatsumeN. Inoue
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JOURNAL FREE ACCESS

2000 Volume 27 Issue 1 Pages 24-

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Abstract
The inclination of subflow tube gives a large influence on the lateral growth rate of GaN. Under the optimum inclination, the reactant gas stays long on the substrate surface , which leads to the efficient decomposition of NH_3, and drains out on the substrate to all directions, which promotes both the lateral and vertical growth rate.
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© 2000 The Japanese Association for Crystal Growth
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