日本結晶成長学会誌
Online ISSN : 2187-8366
Print ISSN : 0385-6275
ISSN-L : 0385-6275
26aE06 大気圧ハライドCVDによるフラワー状InNの成長(ナノエピシンポジウム,第34回結晶成長国内会議)
高橋 直行
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ジャーナル フリー

2004 年 31 巻 3 号 p. 248-

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Preparation of indium nitride has been examined by means of an atmospheric pressure halide chemical vapor deposition technique utilizing a reaction of gaseous InCl_3 and NH_3. From the SEM observations of the crystals deposited onto a Si(100) substrate it was found that they showed flower-like structure, and that each of the flowers has six petals and a style at 823K. It has high symmetry, and possesses a six-fold axis along the style. It was amazing that the crystals constituting a flower have lovely geometry of staggered hexagonal bi-pyramid.
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© 2004 日本結晶成長学会
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