Electron Moiré method is an advanced technique to measure the micro-deformation of the structural materials. In this method, a fine micro-grid prepared by electron beam lithography is used as a model grid, and a scanning exposure of the primary electron beam in a scanning electron microscope (SEM) as a master grid. The scanning exposure of the electron beam on the specimen with the model grid produces moiré fringes of bright and dark lines formed in response to the different amount of the emitted secondary electrons for each primary electron. By this method, inhomogeneous deformations of the materials were measured.
