Journal of the Japan Society for Precision Engineering
Online ISSN : 1882-675X
Print ISSN : 0912-0289
ISSN-L : 0912-0289
Lecture
Lithography Technology since 45 nm Generation
Motokatsu IMAI
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Keywords: immersion lithography, resolution, overlay, throughput, RET (Resolution Enhancement Technology), DP (Double Patterning), SW (Side Wall), EUV (Extreme Ultra Violet)
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2008 Volume 74 Issue 5 Pages 441-446

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© 2008 The Japan Society for Precision Engineering
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